Kinetics of solid phase epitaxy in buried amorphous Si layers formed by MeV ion implantation Journal Articles uri icon

Overview

Published in

  • Applied Physics Letters

Time

Date/time value

  • 1996

Identity

Digital Object Identifier (DOI)

  • 10.1063/1.116945

Additional Document Info

Parent Title

  • Applied Physics Letters

Volume

  • 69

Issue

  • 7

Publisher

  • American Institute of Physics