Dielectric substrate self-bias and plasma confinement in two-dimensional scanning radio frequency plasma-enhanced chemical vapour deposition Journal Articles Refereed uri icon

Overview

Published in

  • Vacuum

Time

Date/time value

  • 2006

Identity

Digital Object Identifier (DOI)

  • 10.1016/j.vacuum.2006.05.014

Additional Document Info

Parent Title

  • Vacuum

Volume

  • 81

Publisher

  • Pergamon