Near coalescent submicron polycrystalline diamond films deposited on silicon: Hydrogen bonding and thermal enhanced carbide formation Journal Articles Refereed uri icon

Overview

Published in

  • Journal of Applied Physics

Time

Date/time value

  • 2009

Identity

Digital Object Identifier (DOI)

  • 10.1063/1.3257255

Additional Document Info

Parent Title

  • Journal of Applied Physics

Volume

  • 106

Number

  • 103503

Publisher

  • American Institute of Physics