Intrinsic and boron-enhanced hydrogen diffusion in amorphous silicon formed by ion implantation Journal Articles Refereed uri icon

Overview

Published in

  • Applied Physics Letters

Time

Date/time value

  • 2009

Identity

Digital Object Identifier (DOI)

  • 10.1063/1.3224189

Additional Document Info

Parent Title

  • Applied Physics Letters

Volume

  • 95

Number

  • 101911

Publisher

  • American Institute of Physics