Dopant enhanced H diffusion in amorphous silicon and its effect on the kinetics of solid phase epitaxy Journal Articles Refereed uri icon

Overview

Published in

  • Materials Science and Engineering B

Time

Date/time value

  • 2009

Identity

Digital Object Identifier (DOI)

  • 10.1016/j.mseb.2008.11.047

Additional Document Info

Parent Title

  • Materials Science and Engineering B

Volume

  • 157

Publisher

  • Elsevier Science